Semiconductor Wet Process Equipment & Custom Solutions
High-precision wafer cleaning systems, automated wet benches, and custom process equipment engineered for 200 nm standard particle removal, optimized down to 100 nm, while maximizing wafer yield.
Full-Spectrum Semiconductor Wet Process Equipment Matrix
KOSEN SEMI delivers an end-to-end wet process portfolio ranging from standard manual wet benches to ultra-precise single-wafer cleaning systems. Engineered to fulfill the rigorous cleanliness, yield, and chemical safety standards of modern semiconductor fabrication, our product lineup addresses critical wet processing steps across front-end wafer manufacturing, back-end advanced packaging, MEMS, and power electronics.
Wafer Cleaning Systems
Advanced single-wafer spin processors and automated multi-tank batch immersion systems engineered for high-throughput 200 nm standard particle removal, optimized down to 100 nm. Utilizing megasonic agitation and micro-porous chemical spray technologies, our wafer-cleaning-systems remove organic and metallic residues while supporting wafer substrate integrity.
- Particle Removal:Standard ≥200 nm; optimized ≥100 nm
- Throughput: Up to 120 WPH (Single) / 300 WPH (Batch)
- Substrates: 150mm, 200mm, 300mm Silicon, SiC, GaN
Semiconductor Wet Benches
Versatile manual, semi-automated, and fully automated semiconductor wet benches for precise acid, solvent, and alkaline etching and cleaning. Constructed with fire-retardant polypropylene, PVDF, or quartz tanks, featuring continuous chemical inline dosing and tight temperature control.
- Automation: Manual, Semi-Auto, & Fully Automated Robotics
- Process Chemistry: SPM, DHF, BOE, SC1, SC2, Solvents
- Dosing Accuracy: ±0.1% Volumetric Concentration
Semiconductor Scrubber Systems
High-efficiency gas scrubbing and point-of-use exhaust mitigation tools for corrosive acid mist, alkaline vapours, and hazardous chemical emissions. Built with multi-stage neutralization beds, continuous pH sensing, and automatic replenishment to ensure full fab environmental compliance.
- Mitigation Performance:Application Dependent
- Airflow Capacity: 50 to 500 m³/min Custom Configurable
- Compliance: SEMI S2 / S8, CE, ISO 14001 Standards
Chemical Cleaning Equipment
Ultra-pure chemical delivery and recirculation modules featuring automated inline chemical blending, point-of-use micro-filtration, and closed-loop temperature control. Designed to maintain controlled chemical purity and optimize consumption in continuous high-volume manufacturing.
- Dosing Precision: ±0.05% Volumetric Control
- Filtration Rating: Down to 0.005 μm High Purity Filters
- Recirculation: Continuous High-Flow Closed Loop
Custom Semiconductor Equipment
Tailored non-standard engineering and OEM/ODM system integration for specialized fab requirements, compound semiconductors, MEMS, and pilot R&D lines. Providing end-to-end support from CAD structural modeling and robotic automation programming to SECS/GEM interface integration.
- Engineering Scope: Full Turnkey Custom OEM / ODM
- Factory Automation: Integrated SECS/GEM Interface
- Footprint: Custom Cleanroom Modular Dimensions
Engineered for Fab Reliability, Micro-Particle Control, and Yield Maximization
Choosing the correct wet process configuration is vital to controlling micro-contamination and supporting wafer production yields. Every system within the KOSEN SEMI product matrix is constructed using ultra-high-purity fluoropolymer fluid lines, corrosion-resistant cabinet structures, and advanced PLC control architecture. Whether your fab requires automated single-wafer cleaning systems or rugged semiconductor wet benches for compound semiconductor processing, our engineered solutions support repeatable performance and cleanroom integration.
High-Volume Process Stability
Automated robotic handling and continuous chemical dosing deliver batch-to-batch repeatability across continuous manufacturing runs.
Leak-Resistant Safety Architecture
Enclosed dual-containment fluidics, automated gas scrubbing, and interlocked safety sensors protect cleanroom operators and environment.
Modular Upgrade Potential
Scalable physical and digital designs support future fab expansions, new chemistries, and emerging wafer dimensions.
Safe & Efficient Exhaust Treatment and Chemical Wet Processing Technologies
Modern semiconductor fabrication demands reliable operation, environmental compliance, and controlled chemical purity. Backed by our advanced Engineering Capability, KOSEN SEMI scrubber systems and chemical handling equipment feature specialized anti-corrosion materials and intelligent automation engineered for aggressive semiconductor environments. By combining multi-stage exhaust neutralization with high-precision chemical metering systems, our solutions help protect fab infrastructure, maintain regulatory alignment, and safeguard wafer yields across production and specialized cleanroom operations.
Advanced Semiconductor Scrubber Systems for Exhaust Mitigation
Aggressive wet etching, stripping, and cleaning operations generate toxic, acidic, and alkaline exhaust streams that threaten environmental safety and fab air purity. KOSEN SEMI engineers high-performance semiconductor scrubber systems designed specifically for real-time gas neutralization and fume extraction. Utilizing multi-pass absorption columns and micro-porous spray arrays, our scrubbers neutralize volatile emissions prior to atmospheric discharge.
- ✓Multi-Stage Gas Neutralization: Integrates dual acid and alkaline packed towers with high-efficiency mist eliminators to provide application-dependent gas neutralization performance under fluctuating fab exhaust loads.
- ✓Automated pH & ORP Controls: Closed-loop sensor networks continuously evaluate chemical concentration and dynamically dose neutralization agents to optimize chemical consumption and prevent emission spikes.
- ✓Corrosion-Resistant Polymer Construction: Fabricated from premium PP, PVC, PVDF, and PFA materials, ensuring long-term structural integrity against aggressive fluorine, chlorine, and acid vapors.
- ✓SEMI S2 & Environmental Compliance: Engineered in compliance with strict SEMI S2/S8 standards and local environmental discharge guidelines for seamless utility integration.
Multi-Stage Exhaust Gas Neutralization
Process schematic highlighting continuous wet gas scrubbing, chemical dosing loops, and real-time emissions monitoring.
Automated Chemical Dosing & Filtration
High-purity chemical management console with continuous 200 nm standard particle filtration, optimized down to 100 nm and auto-replenishment.
High-Purity Chemical Cleaning Equipment & Automated Dosing
Ultra-clean substrate processing demands exact chemical stoichiometry and controlled liquid-phase contamination. KOSEN SEMI chemical cleaning equipment incorporates fully enclosed fluoropolymer fluid pathways and ultra-pure distribution loops. Engineered for continuous duty in wafer fabrication facilities, these systems interface with advanced wafer cleaning systems to automate chemical blending, inline heating, recirculation, and 200 nm standard particle removal, optimized down to 100 nm. For precise single-substrate handling, we also integrate specialized Single Wafer Cleaning Systems to support yield protection.
- ✓High-Purity Anti-Corrosive Piping: Fully enclosed PFA and PTFE fluid pathways minimize metallic-ion leaching and material-degradation risks from hydrofluoric, sulfuric, and nitric acids.
- ✓Automated Chemical Replenishing: Real-time chemical concentration sensors automatically inject fresh reagents, ensuring constant bath potency and batch-to-batch process repeatability.
- ✓Continuous Recirculation Filtration: PTFE membrane filter modules supporting 200 nm standard particle control and optimized capability down to 100 nm trap micro-particulates during active circulation, safeguarding micro-structures against re-contamination.
- ✓Smart Interlock & Safety Automation: Integrated optical leak detectors, automated emergency shut-off valves, and redundant thermal sensors deliver fail-safe operation.
Target Application Scenarios Across Fabs & R&D Environments
Whether retrofitting existing wet processing lines or equipping new cleanrooms, KOSEN SEMI scrubber systems and chemical processing equipment deliver adaptable, fully compliant solutions tailored to specialized manufacturing requirements.
Commercial Fab Expansions
Engineered for semiconductor foundries requiring continuous exhaust abatement, centralized chemical dosing, reliable operation, and support for environmental compliance.
R&D & Pilot Cleanrooms
Compact, modular scrubber and chemical dispensing systems optimized for research institutes, university laboratories, and specialty micro-fabrication pilot facilities.
Hazardous Chemical Environments
Reinforced containment secondary enclosures and specialized scrubbing columns designed to safely manage volatile, toxic, and highly reactive chemical lines.
High-Yield Front-End Wet Cleaning & Etching
Advanced silicon wafer cleaning systems demand extreme chemical purity and strict particle control. KOSEN SEMI Single Wafer Cleaning Systems and batch tools deliver uniform wet etching, residue removal, and surface conditioning to maximize line yields.
Post-CMP cleaning, high-selectivity wet etching, photoresist stripping, and RCA surface conditioning.
KOSEN Saturn-300 Single Wafer Cleaner, KOSEN Hydro-Etch Batch System.
Core Process Parameters
Advanced Wet Process Engineering Specifications and Capability Matrix
KOSEN SEMI wet process equipment is engineered to meet demanding semiconductor fabrication standards. Every system is validated against stringent technical benchmarks—from particle removal efficiency to chemical dosing precision—ensuring repeatable yield across high-volume production environments. Proprietary control systems developed by KOSEN SEMI deliver exceptional process repeatability across continuous high-volume production runs, making our equipment a trusted choice for advanced semiconductor packaging, optocoupler wet process lines, and precision wafer fabrication. Learn more about-us and why global partners build trust in our manufacturing excellence.
The capability matrix below provides a transparent, side-by-side comparison of key process parameters across KOSEN SEMI's core wet process equipment configurations. Use this reference to evaluate system fit for your specific fab requirements, cleanroom class, and automation strategy.
Megasonic Agitation Technology
High-frequency megasonic energy supports 200 nm standard particle removal and optimized capability down to 100 nm from wafer surfaces without mechanical contact, preserving delicate micro-structures during advanced semiconductor packaging and MEMS wet process steps.
Micro-Porous Spray Distribution
Precision micro-porous nozzle arrays deliver uniform chemical coverage across the wafer surface, reducing edge-exclusion issues and supporting consistent etch and clean results for optocoupler wet process and IC manufacturing lines.
High-Frequency Surface Cleaning Integration
Combined megasonic and high-frequency ultrasonic modules work in tandem to achieve superior micro-structure integrity, supporting 200 nm standard particle control and optimized capability down to 100 nm, as well as advanced packaging pre-bond surface preparation.
Wet Process Equipment Capability Comparison
| Parameter | Manual Wet Bench | Semi-Auto System | Fully Automated System | Single-Wafer Platform |
|---|---|---|---|---|
| Cleanroom Class Compatibility | ISO Class 5–7 | ISO Class 5–7 | ISO Class 5–7 | ISO Class 5–7 |
| Particle Removal Efficiency (PRE) | Application dependent | Application dependent | Application dependent | Application dependent |
| Chemical Dosing Accuracy | ± 5% | ± 2% | ± 0.5% | ± 0.1% |
| Automation Level | Manual | Semi-Auto | Fully Auto | Fully Auto + AI Recipe |
| SEMI Standard Compliance | SEMI S2 | SEMI S2 / S8 | SEMI S2 / S8 / F47 | SEMI S2 / S8 / F47 / E10 |
| Megasonic Agitation | — | Optional | Standard | Dual-Frequency Standard |
| Micro-Porous Spray Distribution | — | Optional | Standard | High-Density Array |
| Wafer Size Support | Up to 200mm | Up to 300mm | Up to 300mm | Up to 300mm / Custom |
| Typical Application | R&D / Pilot Lines | Low-Volume Production | High-Volume Fab | Advanced Packaging / MEMS |
All specifications represent standard configurations. Custom engineering parameters are available upon request. Contact KOSEN SEMI for application-specific validation data.
Engineering Precision Built Into Every System
KOSEN SEMI wet process platforms are designed from the ground up for process repeatability and long-term operational stability. Our proprietary closed-loop control architecture continuously monitors chemical concentration, temperature, flow rate, and particle counts—automatically compensating for process drift before it affects yield.
For semiconductor packaging applications, where 200 nm standard surface cleanliness, optimized down to 100 nm, directly impacts bond yield and device reliability, KOSEN SEMI Single Wafer Cleaning Systems provide application-dependent particle removal performance with chemical dosing accuracy configured to project requirements. Final specifications are confirmed under agreed production conditions.
Optocoupler wet process lines demand exceptional chemical uniformity across large batch sizes. KOSEN SEMI automated wet bench systems integrate real-time chemical analysis with automated replenishment, maintaining bath chemistry within specification across thousands of wafer passes without manual intervention.
- Full SEMI S2 / S8 / F47 compliance across all automated and single-wafer platforms, with third-party certification documentation available for every delivered system.
- Scalable automation architecture allows fabs to start with semi-auto configurations and upgrade to fully automated operation without replacing core hardware.
- 100% factory pre-commissioning in an ISO Class 5–7 cleanroom environment supports equipment validation and rapid fab integration.
- Custom engineering support for non-standard wafer sizes, exotic chemistries, and specialized process sequences—from initial CAD design through final software calibration.
Rigorous Quality Management & Worldwide Service Commitment
As a semiconductor equipment manufacturer, KOSEN SEMI applies ISO-aligned quality management and international quality protocols across wet processing equipment, including wafer-cleaning-systems. From ISO Class 5–7 cleanroom testing to global field support, our processes support tool reliability and operational safety for fab environments.
ISO 9001 & ISO 14001
Certified quality and environmental management systems ensuring continuous process control, repeatable yield, and sustainable manufacturing.
SEMI S2 / S8 Compliance
Full alignment with SEMI S2 health, safety, and environmental standards alongside SEMI S8 human factors design criteria for secure fab integration.
ISO Class 5–7 Cleanroom Testing
100% pre-shipment equipment commissioning and strict particle verification conducted in ISO Class 5–7 cleanroom environments prior to client delivery.
24/7 Field Service Support
Worldwide technical support infrastructure with rapid spare parts dispatch to maximize equipment uptime and operational continuity.
Verified Manufacturing Facility & Testing Facility
Learn more about our manufacturing capabilities, quality systems, official certifications, and facility standards to ensure reliable semiconductor equipment supply and long-term project assurance.
Semiconductor Equipment Procurement & Integration FAQ
Clear guidance regarding custom equipment integration, SEMI safety standards compliance, manufacturing lead times, and global after-sales service from KOSEN SEMI.
Does KOSEN SEMI support fully custom, non-standard wet bench engineering?
Yes. KOSEN SEMI specializes in non-standard custom equipment integration, tailoring wet benches and wafer cleaning tools to client specifications, complex fab footprints, non-standard substrate dimensions (ranging from 2-inch to 12-inch wafers, plus SiC, GaN, and sapphire), and aggressive chemical processes.
Our end-to-end custom engineering process includes:
- CAD Structural & Fluid Design: High-precision 3D CAD engineering utilizing FM4910-compliant thermoplastics (PTFE, PVDF, PFA) for ultimate chemical resistance, structural integrity, and cleanroom fire safety.
- Automated Chemical Dosing & Controls: Tailored PLC and HMI programming featuring closed-loop chemical replenishment, automated bath temperature monitoring, and adaptive recipe management.
- Turnkey Testing & Validation: Factory Acceptance Testing (FAT) performed in ISO Class 5–7 cleanroom environments prior to tool crating and delivery.
From single wafer cleaning systems for R&D processing units to multi-tank automated production benches, our engineering group adapts mechanical structures and control software to ensure seamless tool integration into your cleanroom facility.
What is the typical lead time for standard versus custom wet process equipment?
Delivery schedules vary based on equipment complexity, component procurement cycles, and degree of automation. KOSEN SEMI maintains an agile manufacturing pipeline inside our state-of-the-art manufacturing facility to keep cleanroom ramp-up schedules strictly on target:
Covers baseline manual wet benches, standard chemical delivery skids, and standalone scrubber units.
Includes specialized robotic handling, custom chemical distribution, and multi-stage exhaust integration.
All timelines include rigorous Factory Acceptance Testing (FAT) and complete quality sign-offs. Transparent milestone schedules are established during the initial quotation stage.
Are all wet process systems compliant with SEMI S2 and safety standards?
Yes. Operational safety and environmental compliance are core to our engineering design. All wet benches, chemical cleaning tools, and scrubber systems manufactured by KOSEN SEMI meet or exceed stringent international semiconductor standards:
- SEMI S2 Compliance: Rigorous safety guidelines covering electrical system isolation, emergency off (EMO) integration, chemical splash containment, and toxic gas exhaust monitoring.
- SEMI S8 Compliance: Ergonomics engineering standards that ensure safe operator interaction, comfortable access heights, and intuitive UI placement.
- Third-Party Certification: Complete documentation packages, electrical safety compliance (CE, UL 508A), and third-party evaluation reports are provided with every delivery.
These safety frameworks ensure hassle-free site sign-offs and smooth integration into tier-1 semiconductor fabs worldwide.
How does KOSEN SEMI manage overseas installation, commissioning, and after-sales service?
KOSEN SEMI maintains an experienced global field service engineering team providing full lifecycle equipment maintenance, on-site commissioning, and continuous process upgrades. Our international after-sales service framework includes:
Can legacy wet process tools be upgraded with automated chemical handling or megasonics?
Yes. Modular retrofitting is a core capability at KOSEN SEMI. Fabs looking to extend the useful lifecycle of existing wet benches without investing in entirely new frames can upgrade specific subsystem modules:
- Cleaning Efficiency Upgrades: Integrating multi-frequency megasonic transducers or micro-porous atomized spray nozzles for 200 nm standard particle removal with optimized capability down to 100 nm.
- Automation Retrofits: Converting manual chemical dipping stations into semi-automated robotic transfer systems with automated chemical dosing loops.
- Safety & Exhaust Modifications: Retrofitting older exhaust manifolds with high-efficiency inline gas scrubbers to comply with updated local environmental regulations.