KOSEN SEMI R&D Engineering

Custom Semiconductor Equipment Engineering & Wet Process Solutions

KOSEN SEMI leverages deep R&D expertise to deliver customized wet process equipment—from automated wafer cleaning systems to high-precision acid etching and stripping systems—engineered for 200 nm process control, with optimized capability down to 100 nm and maximum fab productivity.

Customized Flow Field Design
Cleanroom-Grade Assembly
Automated Control Integration
Engineering Specs SEMI Compliant
Process Control Precision
Micron-Level Control
CFD-optimized fluid dynamics and precise chemical temperature management.
Equipment Scope
Cleaning, Etching & Stripping
Custom bench architectures built for advanced semiconductor manufacturing.
Manufacturing Quality
ISO Class 5–7 Cleanroom Built
High-purity anti-corrosion assembly adhering to SEMI S2/S8 standards.
Engineering Excellence

Precision Metrics Driving Process Yield

KOSEN SEMI enforces strict engineering benchmarks across design, assembly, and thermal management—ensuring every wet process system delivers micron-level precision and uncompromising process control. Learn more about-us and our dedication to performance.

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Thermal Control Precision

Sub-degree chemical temperature stability engineered to guarantee consistent etch rates and process repeatability.

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Proprietary CFD Fluid Design

In-house Computational Fluid Dynamics modeling eliminates dead zones and optimizes chemical recirculation efficiency.

ISO Class 5–7

Cleanroom Assembly Standard

ISO Class 5–7 cleanroom environments prevent particulate contamination at our manufacturing-facility during system fabrication.

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Custom Systems Deployed

Over 100 tailored wet bench and advanced wafer-cleaning-systems successfully delivered to global semiconductor manufacturers.

Factory Standard Verification

Quality Assurance Embedded Across Every Process Stage

From CFD flow field simulations to high-purity piping design and ISO-certified cleanroom assembly, KOSEN SEMI integrates total process validation into every custom equipment build.

Ultra-High Purity Piping
Full Process Traceability
ISO
Manufacturing Standard
ISO 9001 & ISO 14001
CFD
Fluid Dynamic Modeling
Zero Dead-Zone Flow Rate
Multi-Field Application Matrix

Custom Equipment Engineering Across Semiconductor Applications

Different semiconductor sectors demand distinct chemical, thermal, and mechanical handling strategies. The KOSEN SEMI engineering team deeply understands specialized process characteristics across various sectors, engineering dedicated wet process equipment tailored to complex manufacturing requirements. From high-density interconnect micro-via cleaning in advanced packaging wet process workflows to aggressive compound power semiconductor cleaning and delicate MEMS wet process drying, our custom equipment engineering guarantees process repeatability, substrate protection, and continuous operational efficiency.

Application Focus

Advanced Packaging and High-Density Interconnect Cleaning

Modern 2.5D and 3D advanced packaging architectures demand immaculate micro-via residue removal and feature surface conditioning. KOSEN SEMI engineers specialized wet bench wafer cleaning systems that incorporate targeted megasonic and ultrasonic transducers to agitate fluid layers at high frequencies without compromising fragile wafer interconnect structures.

By optimizing chemical concentration delivery and fluid recirculation patterns, our advanced packaging wet process machinery removes particles at 200 nm production scale, with optimized removal down to 100 nm from deep aspect ratio blind vias while maintaining high throughput and minimal bath degradation.

Advanced Packaging Wet Process Equipment Architecture

Core Engineering Capability Highlights

  • Frequency-Swept Megasonic Systems: Prevents standing wave damage while removing 200 nm-class contaminants, with optimized capability down to 100 nm from high-density vias.
  • Boundary Layer Displacement: CFD-optimized chemical flow patterns ensure uniform exposure across entire wafer surfaces.
  • Multi-Chemical Recirculation: Inline filtration down to 0.05 μm preserves chemical purity and extends bath operational life.
  • Secure Automated Handling: High-precision robotic end-effectors ensure zero mechanical defect generation during transfer.
Target Processes: Flip-Chip, Fan-Out, TSV, 200 nm-Class Via Cleaning Consult Engineering Team
Engineering & Quality Assurance

Quality Standards, Cleanroom Assembly, and Testing Validation

KOSEN SEMI strictly executes SEMI standards and comprehensive quality management systems across every phase of equipment manufacturing. From high-purity component machining to final ultrapure chemical testing, our facilities guarantee zero contamination, exceptional process stability, and full semiconductor equipment compliance for advanced fab operations.

Controlled Cleanroom Assembly Environment

Delivering high-yield wet processing solutions demands uncompromising environmental purity during tool construction. KOSEN SEMI operates dedicated ISO Class 5–7 cleanroom assembly zones engineered specifically for advanced wafer cleaning systems, including specialized Single Wafer Cleaning Systems, wet benches, and automated acid stripping machinery.

Our specialized technicians enforce strict cleanroom protocols during chemical fluid manifold integration and structural chassis assembly. High-purity fluoropolymer piping, including PFA, PVDF, and PTFE fluid lines, is welded and fitted inside ultra-filtered air environments to prevent ambient particulates and trace metallic ions from compromising internal fluid pathways.

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ISO Class 5 Zone Reserved for critical chemical manifold welding, robotic wafer handler alignment, and chemical delivery loop integration.
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ISO Class 6–7 Bay Dedicated to structural frame integration, automated electrical panel wiring, and full-system tool assembly.
ISO Class 5–7 cleanroom assembly and testing validation at KOSEN SEMI facility

Ultra-clean chemical delivery manifold inspection inside KOSEN SEMI ISO Class 5–7 cleanroom assembly zone

International Safety & Compliance Certifications

SEMI
SEMI S2 S8 Standards

Full compliance with SEMI S2 (Environmental, Health, and Safety) and SEMI S8 (Ergonomics) guidelines for seamless semiconductor fab integration.

CE
CE Mark Certification

Strict alignment with European Union Machinery Directives, Electromagnetic Compatibility (EMC), and Low Voltage Safety standards.

ISO
ISO 9001:2015 System

Certified quality management framework governing semiconductor wet bench systems engineering design, procurement, cleanroom assembly, and testing validation.

Precision Testing & Quality Validation Methods

Prior to tool dispatch, every custom engineering build undergoes rigorous physical, electrical, and chemical validation to ensure ultimate reliability and immediate factory acceptance.

  • Helium Mass Spectrometer Leak Detection Ultra-sensitive vacuum and pressure decay testing to confirm zero-leak seal integrity across chemical, gas, and vacuum lines.
  • Particle Counter Testing In-line liquid and airborne particulate monitoring for 200 nm production, with optimized monitoring down to 100 nm during dry operation and UPW recirculation cycling.
  • Infrared Tube Welding Inspection Non-destructive thermographic examination of PFA and PVDF tube welds to guarantee completely smooth, bead-free interior surfaces.

Factory Acceptance Testing (FAT) & Safety Interlock Protocols

KOSEN SEMI executes structured verification protocols across all custom equipment builds. Our comprehensive Factory Acceptance Testing (FAT) and Site Acceptance Testing (SAT) frameworks guarantee full chemical containment, leak-free performance, and rapid automation interlock response prior to production line deployment.

Validation Area Inspection Method Target Technical Benchmark Quality Deliverable
Airtightness & Containment Helium mass spectrometer leak testing under positive and negative differential pressure < 1 × 10⁻⁹ mbar·l/s leak rate threshold Certified mass spec leak inspection report
Fluoropolymer Weld Quality Non-destructive infrared tube welding inspection and surface bead profile scanning 100% bead-free continuous interior bore Thermographic joint integrity & weld dossier
Process Water Cleanliness Laser liquid particle counter (LPC) monitoring in UPW recirculation loops Controlled particle level at ≥200 nm, per agreed process specification Liquid particle baseline validation log
Electrical & Emergency Interlocks SEMI S2 hazard sensor triggering and EMO push-button fault injection simulations < 100 ms automated shutoff response Third-party SEMI S2 compliance certificate
Engineering Capability FAQ

Semiconductor Custom Engineering FAQ & Wet Process OEM Design

KOSEN SEMI delivers high-precision custom semiconductor equipment engineering and wet process OEM design solutions for demanding fab applications. Learn more about-us and explore technical insights below regarding custom wet bench engineering, development lead times, legacy system retrofits, and cleanroom manufacturing standards.

Yes, KOSEN SEMI specializes in complete end-to-end custom semiconductor equipment engineering. We design and build bespoke chemical wafer-cleaning-systems, spin rinser dryers (SRD), and automated wet benches tailored to client-specific process chemistries, unique fab layouts, and non-standard substrate dimensions (including Si, SiC, GaN, GaAs, and glass).

Our multidisciplinary engineering team integrates advanced thermal, chemical, and fluid mechanical design capabilities:

  • Custom Flow Field Engineering: Self-developed CFD fluid dynamics simulations eliminate stagnant boundary layers and maximize chemical delivery uniformity across micro-structures.
  • Tailored Tank & Cabinet Mechanics: Precision CNC machining of ultra-high-purity fluoropolymers (PFA, PVDF, PTFE) to withstand aggressive acid etching, solvent stripping, and high-temperature baths.
  • Specialized Substrate Handling: Custom-engineered robot end-effectors, Bernoulli wands, and non-contact transfer mechanisms designed specifically for ultra-thin or fragile wafers.
  • Bespoke Automation & Fab Integration: Seamless PLC architecture programming with SECS/GEM (E30/E37) host communications for fully automated fab line synchronization.
KOSEN SEMI Wet Process Equipment Engineering R&D Facility
Engineering Support

Direct Technical Consultation With KOSEN SEMI

Need customized technical solutions for your semiconductor wet process project? KOSEN SEMI engineering experts are available to discuss process optimization, fluid simulation, and custom equipment specifications.

Free Fluid Dynamics (CFD) Initial Assessment
Customized CAD Drawings & Mechanical Modeling
ISO Class 5–7 Assembly Quality Controls
Request Engineering Consultation

Speak directly with experienced wet process equipment engineers.

Direct Senior Engineering Support

Ready to Start Your Custom Semiconductor Wet Process Equipment Project?

Consult about-us at KOSEN SEMI today to receive a complimentary fluid simulation evaluation and a tailored custom wet process solution proposal for your fab line.

Speak directly with KOSEN SEMI engineering specialists to co-develop high-precision Automatic Wet Bench Systems and cost-effective semiconductor equipment solutions.

  • Complimentary CFD Flow Evaluation: Validate bath velocity and chemical distribution prior to equipment fabrication.
  • Tailored Hardware Engineering: Customized wet bench architectures using specialized Manual Wet Bench Systems, chemical delivery systems, and wafer cleaning modules.
  • Rapid Engineering Consultation: Preliminary technical assessments and feasibility scoping delivered within 24 business hours.

Request a Custom Wet Process Solution Proposal

Submit your project parameters below for immediate review by our engineering team.

Your technical data and project details are held strictly confidential under NDA guidelines.

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